9780819445179
Photomask and Next-generation Lithography Mask Technology IX
Hiroichi Kawahira; Society of Photo-Optical Instrumentation Engineers; Bacus (Technical Group); Oyo Butsuri Gakkai; Photomask Japan; Semiconductor Equipment and Materials International (Japan)
ISBN 13: 9780819445179
Publisher: Society of Photo Optical
Publication Date: 2002
Binding: Softcover
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Photomask and Next-generation Lithography Mask Technology IX: Search Results
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Photomask and Next-generation Lithography Mask Technology IX (Proceedings of SPIE Volume 4754) (ISBN: 0819445177 / 0-8194-4517-7) Kawahira, Hiroichi;Society of Photo-Optical Instrumentation Engineers;Bacus (Technical Group);Oyo Butsuri Gakkai;Photomask Japan;Semiconductor Equipment and Materials International (Japan) Quantity Available: 1
Book Description: Society of Photo Optical, Bellingham, Washington, U.S.A., 2002. Soft cover. Book Condition: Very Good Condition. 4to - over 9¾ - 12" tall. 918 pages. Yellow covers. Book. Bookseller Inventory # L034138 Bookseller & Payment Information | More Books from this Seller | Ask Bookseller a Question |
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Photomask and Next-generation Lithography Mask Technology IX (Proceedings of SPIE Volume 4754) (ISBN: 0819445177 / 0-8194-4517-7) Kawahira, Hiroichi;Society of Photo-Optical Instrumentation Engineers;Bacus (Technical Group);Oyo Butsuri Gakkai;Photomask Japan;Semiconductor Equipment and Materials International (Japan) Quantity Available: 1
Book Description: Society of Photo Optical, Bellingham, Washington, U.S.A., 2002. Soft cover. Book Condition: Very Good Condition. 4to - over 9¾ - 12" tall. 918 pages. Yellow covers. Book. Bookseller Inventory # L034137 Bookseller & Payment Information | More Books from this Seller | Ask Bookseller a Question |
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