Plasma Diagnostics, Volume 2: Surface Analysis and Interactions (Plasma-Materials Interactions)

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9780120676361: Plasma Diagnostics, Volume 2: Surface Analysis and Interactions (Plasma-Materials Interactions)
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Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Plasmas are used in microelectronics to process semiconductors (etching of patterns for microcircuits, plasma-induced deposition of thin films, etc.); plasmas produce deleterious erosion effects on surfaces of materials used for fusion devices and spaceships exposed to the low earth environment.
Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject.
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Plasmas and their interaction with materials have become subjects of major interest because of their importance in modern forefront technologies such as microelectronics, fusion energy, and space. Diagnostics of plasmas and materials exposed to them are fundamental to the understanding of the physical and chemical phenomena involved. Plasma Diagnostics provides a comprehensive treatment of the subject.

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"This is a useful introductory reference book for workers in plasma-based etching and deposition, surface modifications and fusion. The book is a very good compilation of authoritative review chapters on current uses of surface sensitive probes to plasma diagnostics. Plasma science and technology are highly interdisciplinary fields, and this book provides interesting different perspectives on how to approach the study of a surface interacting with a plasma. It should serve as a good starting point for physicists, chemists, or materials scientists who would like to become familiar with this area."
--MRS BULLETIN

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Published by Academic Press (1989)
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Orlando Auciello (Editor), Daniel L. Flamm (Editor)
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