Plasma Etching: An Introduction (Plasma -- Materials Interactions)

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9780124693708: Plasma Etching: An Introduction (Plasma -- Materials Interactions)

Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

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"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
--AUSTRALIAN PHYSICIST
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS

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Published by Elsevier Science Publishing Co Inc, United States (1989)
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Book Description Elsevier Science Publishing Co Inc, United States, 1989. Hardback. Book Condition: New. 229 x 157 mm. Language: English . This book usually ship within 10-15 business days and we will endeavor to dispatch orders quicker than this where possible. Brand New Book. Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods. Bookseller Inventory # EOD9780124693708

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MANOS, DENNIS; FLAMM, DANIEL
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Book Description Academic Press, 1989. Hardback. Book Condition: NEW. 9780124693708 This listing is a new book, a title currently in-print which we order directly and immediately from the publisher. Bookseller Inventory # HTANDREE0894829

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MANOS, DENNIS; FLAMM, DANIEL
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