Computational Lithography

3 avg rating
( 1 ratings by Goodreads )
 
9780470596975: Computational Lithography
View all copies of this ISBN edition:
 
 

A Unified Summary of the Models and Optimization Methods Used inComputational Lithography

Optical lithography is one of the most challenging areas ofcurrent integrated circuit manufacturing technology. Thesemiconductor industry is relying more on resolution enhancementtechniques (RETs), since their implementation does not requiresignificant changes in fabrication infrastructure. ComputationalLithography is the first book to address the computationaloptimization of RETs in optical lithography, providing an in-depthdiscussion of optimal optical proximity correction (OPC), phaseshifting mask (PSM), and off-axis illumination (OAI) RET tools thatuse model-based mathematical optimization approaches.

The book starts with an introduction to optical lithographysystems, electric magnetic field principles, and the fundamentalsof optimization from a mathematical point of view. It goes on todescribe in detail different types of optimization algorithms toimplement RETs. Most of the algorithms developed are based on theapplication of the OPC, PSM, and OAI approaches and theircombinations. Algorithms for coherent illumination as well aspartially coherent illumination systems are described, and numeroussimulations are offered to illustrate the effectiveness of thealgorithms. In addition, mathematical derivations of alloptimization frameworks are presented.

The accompanying MATLAB® software files for all the RETmethods described in the book make it easy for readers to run andinvestigate the codes in order to understand and apply theoptimization algorithms, as well as to design a set of optimallithography masks. The codes may also be used by readers for theirresearch and development activities in their academic or industrialorganizations. An accompanying MATLAB® software guide is alsoincluded. An accompanying MATLAB® software guide is included,and readers can download the software to use with the guide atftp://ftp.wiley.com/public/sci_tech_med/computational_lithography.

Tailored for both entry-level and experienced readers,Computational Lithography is meant for faculty, graduatestudents, and researchers, as well as scientists and engineers inindustrial organizations whose research or career field issemiconductor IC fabrication, optical lithography, and RETs.Computational lithography draws from the rich theory of inverseproblems, optics, optimization, and computational imaging; as such,the book is also directed to researchers and practitioners in thesefields.

"synopsis" may belong to another edition of this title.

About the Author:

Dr. Xu Ma received a PhD in electrical and computerengineering from the University of Delaware. He is now with theElectrical Engineering and Computer Science Department at theUniversity of California at Berkeley. Dr. Ma's research interestsinclude computational imaging, signal processing, and computationallithography.

Dr. Gonzalo R. Arce received a PhD degree in electricalengineering from Purdue University. He is the Charles Black EvansDistinguished Professor of Electrical and Computer Engineering atthe University of Delaware and holds the Fulbright-NokiaDistinguished Chair in Information and Communications Technologies.Dr. Arce's fields of interest include nonlinear and statisticalsignal processing, digital printing, and computational imaging. Heis a Fellow of the IEEE for his contributions to the theory andapplications of nonlinear signal processing.

Review:

"Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields. " (Consumer Electronics Net, 15 March 2011)

"About this title" may belong to another edition of this title.

Buy New View Book
List Price: US$ 122.00
US$ 109.80

Convert currency

Shipping: FREE
From United Kingdom to U.S.A.

Destination, rates & speeds

Add to Basket

Top Search Results from the AbeBooks Marketplace

1.

Xu Ma, Gonzalo R. Arce
Published by John Wiley and Sons Ltd, United States (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
The Book Depository
(London, United Kingdom)
Rating
[?]

Book Description John Wiley and Sons Ltd, United States, 2010. Hardback. Condition: New. Language: English . Brand New Book. This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches. The book starts with an introduction of optical lithography systems, electric magnetic field principles, and fundamentals of optimization; it goes on to describe algorithms for the development of optimal optical proximity correction, phaseshifting mask, offaxis illumination approaches, and their combinations. The accompanying mathematical derivations and MATLAB (R) software files make it easy for researchers, scientists, engineers, and graduate students and faculty to apply any of the optimization algorithms. Seller Inventory # AAH9780470596975

More information about this seller | Contact this seller

Buy New
US$ 109.80
Convert currency

Add to Basket

Shipping: FREE
From United Kingdom to U.S.A.
Destination, rates & speeds

2.

Ma, Xu
Published by Wileyand#8211;Blackwell (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Quantity Available: 1
Seller:
Books2Anywhere
(Fairford, GLOS, United Kingdom)
Rating
[?]

Book Description Wileyand#8211;Blackwell, 2010. HRD. Condition: New. New Book. Shipped from UK in 4 to 14 days. Established seller since 2000. Seller Inventory # FW-9780470596975

More information about this seller | Contact this seller

Buy New
US$ 100.10
Convert currency

Add to Basket

Shipping: US$ 11.76
From United Kingdom to U.S.A.
Destination, rates & speeds

3.

Xu Ma, Gonzalo R. Arce
Published by John Wiley and Sons Ltd, United States (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
Book Depository International
(London, United Kingdom)
Rating
[?]

Book Description John Wiley and Sons Ltd, United States, 2010. Hardback. Condition: New. Language: English . Brand New Book. This is the first book to address the optimization of resolution enhancement techniques in optical lithography. It provides an in-depth discussion of RET tools that use model-based mathematical optimization approaches. The book starts with an introduction of optical lithography systems, electric magnetic field principles, and fundamentals of optimization; it goes on to describe algorithms for the development of optimal optical proximity correction, phaseshifting mask, offaxis illumination approaches, and their combinations. The accompanying mathematical derivations and MATLAB (R) software files make it easy for researchers, scientists, engineers, and graduate students and faculty to apply any of the optimization algorithms. Seller Inventory # AAH9780470596975

More information about this seller | Contact this seller

Buy New
US$ 113.49
Convert currency

Add to Basket

Shipping: FREE
From United Kingdom to U.S.A.
Destination, rates & speeds

4.

Xu Ma
Published by John Wiley and Sons Ltd
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
THE SAINT BOOKSTORE
(Southport, United Kingdom)
Rating
[?]

Book Description John Wiley and Sons Ltd. Hardback. Condition: New. New copy - Usually dispatched within 2 working days. Seller Inventory # B9780470596975

More information about this seller | Contact this seller

Buy New
US$ 113.18
Convert currency

Add to Basket

Shipping: US$ 9.07
From United Kingdom to U.S.A.
Destination, rates & speeds

5.

Xu Ma, Gonzalo R. Arce
Published by Wiley (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
Ergodebooks
(RICHMOND, TX, U.S.A.)
Rating
[?]

Book Description Wiley, 2010. Hardcover. Condition: New. 1. Seller Inventory # DADAX047059697X

More information about this seller | Contact this seller

Buy New
US$ 121.77
Convert currency

Add to Basket

Shipping: US$ 3.99
Within U.S.A.
Destination, rates & speeds

6.

Xu Ma; Gonzalo R. Arce
Published by Wiley (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
Irish Booksellers
(Portland, ME, U.S.A.)
Rating
[?]

Book Description Wiley, 2010. Condition: New. book. Seller Inventory # M047059697X

More information about this seller | Contact this seller

Buy New
US$ 142.72
Convert currency

Add to Basket

Shipping: US$ 3.27
Within U.S.A.
Destination, rates & speeds

7.

Ma, Xu/ Arce, Gonzalo R.
Published by John Wiley & Sons Inc (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
Revaluation Books
(Exeter, United Kingdom)
Rating
[?]

Book Description John Wiley & Sons Inc, 2010. Hardcover. Condition: Brand New. 1st edition. 226 pages. 9.50x6.25x0.75 inches. In Stock. Seller Inventory # __047059697X

More information about this seller | Contact this seller

Buy New
US$ 165.55
Convert currency

Add to Basket

Shipping: US$ 9.80
From United Kingdom to U.S.A.
Destination, rates & speeds

8.

Xu Ma
Published by Wiley (2010)
ISBN 10: 047059697X ISBN 13: 9780470596975
New Hardcover Quantity Available: 1
Seller:
Books Express
(Portsmouth, NH, U.S.A.)
Rating
[?]

Book Description Wiley, 2010. Hardcover. Condition: New. 1. Ships with Tracking Number! INTERNATIONAL WORLDWIDE Shipping available. Buy with confidence, excellent customer service!. Seller Inventory # 047059697Xn

More information about this seller | Contact this seller

Buy New
US$ 437.59
Convert currency

Add to Basket

Shipping: FREE
Within U.S.A.
Destination, rates & speeds