Handbook for Cleaning for Semiconductor Manufacturing: Fundamentals and Applications

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9780470625958: Handbook for Cleaning for Semiconductor Manufacturing: Fundamentals and Applications
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This comprehensive volume provides an in-depth discussion of thefundamentals of cleaning and surface conditioning of semiconductorapplications such as high-k/metal gate cleaning, copper/low-kcleaning, high dose implant stripping, and silicon and SiGepassivation. The theory and fundamental physics associated with wetetching and wet cleaning is reviewed, plus the surface andcolloidal aspects of wet processing. Formulation developmentpractices and methodology are presented along with the applicationsfor preventing copper corrosion, cleaning aluminum lines, and othersensitive layers. This is a must-have reference for any engineer ormanager associated with using or supplying cleaning andcontamination free technologies for semiconductor manufacturing.

From the Reviews...

"This handbook will be a valuable resource for many academiclibraries. Many engineering librarians who work with a variety ofprograms (including, but not limited to Materials Engineering)should include this work in their collection. My recommendation isto add this work to any collection that serves a campus with amaterials/manufacturing/electrical/computer engineering programsand campuses with departments of physics and/or chemistry withlarge graduate-level enrollment."
Randy Wallace, Department Head, Discovery ParkLibrary, University of North Texas

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Provides an In-depth discussion of surface conditioning forsemiconductor applications

The Handbook of Cleaning for Semiconductor Manufacturing:Fundamentals and Applications provides an in-depth discussion ofsurface conditioning for semiconductor applications. Thefundamental physics and chemistry associated with wet processing isreviewed as well as surface and colloidal aspects of cleaning andetching.

Topics covered in this new reference include:

  • Front end line (FEOL) and back end of line (BEOL) cleaningapplications such as high-k/metal gate post-etch cleaning and poresealing, high-dose implant stripping and cleaning, and germanium,and silicon passivation

  • Formulation development practices, methodology and a newdirections are presented including chemicals used for preventingcorrosion of copper lines, cleaning aluminium lines, reclaimingwafers, and water bonding, as well as the filtering andrecirculating of chemicals including reuse and recycling

  • Wetting, cleaning, and drying of features, such as high aspectratio features and hydrophilic surface states, especially how todry without watermarks, the abilities to wet hydrophobic surfacesand to remove liquid from deep features

  • The chemical reactions and mechanisms of silicon dioxide etchingwith hydrofluoric acid, particle removal with ammoniumhydroxide/hydrogen peroxide mixture, and metal removal withhydrochloric acid

The Handbook of Cleaning for Semiconductor Manufacturing:Fundamentals and Applications is a valuable resource for anyengineer or manager associated with using or supplying cleaning andcontamination free technologies for semiconductor manufacturing.Engineers working for semiconductor manufacturing, capitalequipment, chemicals, or other industries that assures cleanlinessof chemicals, material, and equipment in the manufacturing areawill also find this handbook an indispensible reference.

About the Author:

Karen A. Reinhardt is Principle Consultant at Cameo Consultingin San Jose, California. Currently, Karen works with start-upcleaning companies to develop their technology for acquisition.Prior to forming a consulting company, Karen was employed atNovellus Systems, AMD, and Cypress Semiconductor. She has publishedmore than 30 technical publications, has been awarded sevenpatents, and is co-editor of Handbook of Silicon Wafer CleaningTechnology.

Richard F. Reidy (Ph.D., Penn State) is interim Chair andassociate professor of Material Science and Engineering at theUniversity of North Texas. He has conducted research ininterconnect processing and characterization with over 60 technicalpublications and three patents. He is a member of the InternationalTechnology Roadmap for Semiconductors.

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Book Description John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Condition: New. Language: English. Brand new Book. This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews."This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection.My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Seller Inventory # AAH9780470625958

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Book Description John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Condition: New. Language: English. Brand new Book. This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews."This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection.My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Seller Inventory # AAH9780470625958

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Book Description John Wiley and Sons Ltd, United Kingdom, 2011. Hardback. Condition: New. Language: English. Brand new Book. This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews."This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection.My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment." Randy Wallace, Department Head, Discovery Park Library, University of North Texas. Seller Inventory # LIE9780470625958

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