Physical Vapor Deposition of Thin Films

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9780471330011: Physical Vapor Deposition of Thin Films
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A unified treatment of the theories, data, and technologiesunderlying physical vapor deposition methods With electronic,optical, and magnetic coating technologies increasingly dominatingmanufacturing in the high-tech industries, there is a growing needfor expertise in physical vapor deposition of thin films. Thisimportant new work provides researchers and engineers in this fieldwith the information they need to tackle thin film processes in thereal world. Presenting a cohesive, thoroughly developed treatmentof both fundamental and applied topics, Physical Vapor Depositionof Thin Films incorporates many critical results from across theliterature as it imparts a working knowledge of a variety ofpresent-day techniques. Numerous worked examples, extensivereferences, and more than 100 illustrations and photographsaccompany coverage of:
* Thermal evaporation, sputtering, and pulsed laser depositiontechniques
* Key theories and phenomena, including the kinetic theory ofgases, adsorption and condensation, high-vacuum pumping dynamics,and sputtering discharges
* Trends in sputter yield data and a new simplified collisionalmodel of sputter yield for pure element targets
* Quantitative models for film deposition rate, thickness profiles,and thermalization of the sputtered beam

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About the Author:

JOHN E. MAHAN, PhD, is Professor of Electrical Engineering at Colorado State University.

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Book Description John Wiley and Sons Ltd, United States, 2000. Hardback. Condition: New. New. Language: English. Brand new Book. A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques.Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: Thermal evaporation, sputtering, and pulsed laser deposition techniques Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam. Seller Inventory # AAH9780471330011

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Book Description John Wiley and Sons Ltd, United States, 2000. Hardback. Condition: New. New. Language: English . Brand New Book. A unified treatment of the theories, data, and technologies underlying physical vapor deposition methods With electronic, optical, and magnetic coating technologies increasingly dominating manufacturing in the high-tech industries, there is a growing need for expertise in physical vapor deposition of thin films. This important new work provides researchers and engineers in this field with the information they need to tackle thin film processes in the real world. Presenting a cohesive, thoroughly developed treatment of both fundamental and applied topics, Physical Vapor Deposition of Thin Films incorporates many critical results from across the literature as it imparts a working knowledge of a variety of present-day techniques. Numerous worked examples, extensive references, and more than 100 illustrations and photographs accompany coverage of: Thermal evaporation, sputtering, and pulsed laser deposition techniques Key theories and phenomena, including the kinetic theory of gases, adsorption and condensation, high-vacuum pumping dynamics, and sputtering discharges Trends in sputter yield data and a new simplified collisional model of sputter yield for pure element targets Quantitative models for film deposition rate, thickness profiles, and thermalization of the sputtered beam. Seller Inventory # AAH9780471330011

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