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Synopsis
The only elementary text to provide a complete introduction to diffusion theory and the various analytical and numerical methods of solution. Presents an integrated set of real-life problems taken mainly from metallurgy and device processing, and offers an overview of the solution of diffusion problems in practical cases, with clear explanations of the interrelationships between mathematical solutions, and the underlying physics and chemistry. Covers oxidation theory, error functions, Laplace transforms, and similarity, a topic of current research interest. Also covers Green's functions and integral equations, rarely discussed in introductory texts.
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From the Back Cover
A Primer of Diffusion Problems A Primer of Diffusion Problems is a concise and lively introduction to diffusion theory in its many guises and to a variety of analytical and numerical methods for the solution of diffusion problems. It discusses the diffusion equation, the steady state, diffusion under external forces, time-dependent diffusion, and similarity, thus bridging mathematical and physical treatments of diffusion. Featured topics include a careful development of the oxidation theory of silicon, properties of the family of error functions, precipitation and phase transformations, a concise introduction to Laplace transforms, and nonlinear boundary conditions. Exercises are found throughout the text, and appendices treat rarely found advanced topics.
About the Author
About the author Richard Ghez is a Research Staff Member at the IBM Thomas J. Watson Research Center in Yorktown Heights, New York. He received his doctorate in engineering physics with distinction at the Ecole Polytechnique de Lausanne, Switzerland.
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- PublisherWiley-VCH
- Publication date1988
- ISBN 10 0471846929
- ISBN 13 9780471846925
- BindingPaperback
- LanguageEnglish
- Edition number1
- Number of pages264
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A Primer of Diffusion Problems
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