Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series) - Hardcover
Synopsis
Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series)
Seller: HPB-Diamond, Dallas, TX, U.S.A.
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hardcover. Condition: Very Good. Connecting readers with great books since 1972! Used books may not include companion materials, and may have some shelf wear or limited writing. We ship orders daily and Customer Service is our top priority! Seller Inventory # S_427461204
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Chemical Vapor Deposition Microelectronics Principles Technology Applications
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hardcover. Condition: Good. Hardcover, no jacket. In protective plastic wrap. Clean, unmarked, tightly bound. Moderate exterior wear. (Materials Science and Process Technology Series) Photos available. We ship daily. Expedited shipping available! (Heavy books & sets may require extra shipping charges.). Seller Inventory # FM4151
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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications
Published by
Noyes Pubns, (1987)., Parkdridge, New Jersey, U.S.A., 1987
ISBN 10: 0815511361
ISBN 13: 9780815511366
Used
Hardcover
Seller: Pride and Prejudice-Books, Ballston Lake, NY, U.S.A.
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Hardcover. Condition: Near Fine. Second Printing. Original blue cloth. Previous owner's name in ink, Near Fine. No Dust Jacket. Seller Inventory # 018428