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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology Series) - Hardcover
This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.
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"After reading this book, an engineer should have all the necessary background." - European Semiconductor
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- PublisherWilliam Andrew
- Publication date1993
- ISBN 10 0815512880
- ISBN 13 9780815512882
- BindingHardcover
- Edition number1
- Number of pages251
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications Materials Science and Process Technology
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(1992)
ISBN 10: 0815512880
ISBN 13: 9780815512882
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Book Description HRD. Condition: New. New Book. Shipped from UK. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Seller Inventory # L1-9780815512882
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Materials Science and Process Technology Series)
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William Andrew Inc
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ISBN 10: 0815512880
ISBN 13: 9780815512882
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Book Description Gebundene Ausgabe. Condition: Neu. Neu new item; well packed; Neuware; Rechnung mit MwSt.; Bestellungen bis 15 Uhr werden am gleichen Werktag verschickt.This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.; 251 pp. Englisch. Seller Inventory # INF1000352147
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Published by
William Andrew
(1993)
ISBN 10: 0815512880
ISBN 13: 9780815512882
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Hardcover
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Book Description Condition: New. PRINT ON DEMAND Book; New; Fast Shipping from the UK. No. book. Seller Inventory # ria9780815512882_lsuk
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications
Published by
William Andrew Publishing
(1993)
ISBN 10: 0815512880
ISBN 13: 9780815512882
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Hardcover
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Book Description Hardback. Condition: New. This item is printed on demand. New copy - Usually dispatched within 5-9 working days. Seller Inventory # C9780815512882
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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI ULSI Applications Materials Science and Process Technology
Published by
Elsevier Science
(1992)
ISBN 10: 0815512880
ISBN 13: 9780815512882
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Hardcover
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Book Description HRD. Condition: New. New Book. Delivered from our UK warehouse in 4 to 14 business days. THIS BOOK IS PRINTED ON DEMAND. Established seller since 2000. Seller Inventory # L1-9780815512882
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CHEMICAL VAPOR DEPOSITION OF T
Published by
WILLIAM ANDREW INC
(1993)
ISBN 10: 0815512880
ISBN 13: 9780815512882
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Book Description Gebunden. Condition: New. Supplies the reader with the background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. This book describes materials deposition chemistry, equipment, process technology, developments, and applications.Inhal. Seller Inventory # 595054709
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