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This is a comprehensive text describing the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
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Raymond L. Boxman is a Professor of Electrical and Electronics Engineering at Tel Aviv University, Israel, and is the Managing Director of Arc Technologies, Ltd. He formerly worked on vacuum switch gear R&D at the General Electric Company in Philadelphia, PA. His current interests include phenomena in the vacuum arc anode and plasma, as well as development of vacuum arc deposition coatings and techniques. He is also a Fellow of IEEE.
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Book Description William Andrew, 1997. Hardcover. Condition: New. book. Seller Inventory # M0815513755