Polymers for Microelectronics: Resists and Dielectrics (ACS Symposium Series)

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9780841227217: Polymers for Microelectronics: Resists and Dielectrics (ACS Symposium Series)

Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists.

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Thompson, Larry F. (EDT)/ Willson, C. Grant (EDT)/ Tagawa, Seiichi (EDT)
Published by Oxford Univ Pr (1994)
ISBN 10: 0841227217 ISBN 13: 9780841227217
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Book Description Oxford Univ Pr, 1994. HRD. Book Condition: New. New Book. Shipped from US within 10 to 14 business days. Established seller since 2000. Bookseller Inventory # VU-9780841227217

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Published by American Chemical Society, United States (1994)
ISBN 10: 0841227217 ISBN 13: 9780841227217
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Book Description American Chemical Society, United States, 1994. Hardback. Book Condition: New. Language: English . This book usually ship within 10-15 business days and we will endeavor to dispatch orders quicker than this where possible. Brand New Book. Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry development resists. Examines the fundamental chemistry of radiation-sensitive materials, including dielectric polymers for integrated circuits and interconnect systems. Valuable reading for polymer chemists, radiation chemists, and materials scientists. Bookseller Inventory # BTE9780841227217

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Larry F. Thompson (Editor), C. Grant Willson (Editor), Seiichi Tagawa (Editor)
Published by American Chemical Society (1994)
ISBN 10: 0841227217 ISBN 13: 9780841227217
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Book Description American Chemical Society, 1994. Hardcover. Book Condition: New. Bookseller Inventory # DADAX0841227217

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ISBN 10: 0841227217 ISBN 13: 9780841227217
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Book Description 1994. Hardcover. Book Condition: New. Hardcover. Presents recent advances in chemically amplified resists for deep UV, electron beam, and X-ray advanced lithographic technologies. Discusses top surface imaging and dry develo.Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability. 554 pages. 0.880. Bookseller Inventory # 9780841227217

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