Ion Beam Analysis: Fundamentals and Applications

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9781439846384: Ion Beam Analysis: Fundamentals and Applications

Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization.

The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology.

  • Examines classical collision theory
  • Details the fundamentals of five specific ion beam analysis techniques
  • Illustrates specific applications, including biomedicine and thin film analysis
  • Provides examples of ion beam analysis in traditional and emerging research fields

Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA.

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About the Author:

Michael Nastasi is director of the Nebraska Center for Energy Sciences Research (NCESR) and Elmer Koch Professor in the Department of Mechanical and Materials Engineering at the University of Nebraska-Lincoln. Prior to this appointment he was director of the Department of Energy (DOE) Energy Frontier Research Center on Materials at Irradiation and Mechanical Extremes and nanoelectronics and mechanics thrust leader at the Center for Integrated Nanotechnologies (CINT). He served as team leader for the Nanoscience and Ion–Solid Interaction Team and as fellow at Los Alamos National Laboratory. He earned his PhD in materials science and engineering at Cornell University. Dr. Nastasi is an elected fellow of the American Physical Society (APS) and the Materials Research Society (MRS).

James W. Mayer
(1930–2013), was a pioneer in the application of ion beam techniques for materials analysis. He received his PhD from Purdue University, followed by appointments at California Institute of Technology (1967–1980) and Cornell University (1980-1992), as Francis Norwood Bard Professor of Materials Science and Engineering and director of the Microscience and Technology Program. He was appointed to the faculty at Arizona State University (ASU) in 1992, where he became Regents’ Professor and P.V. Galvin Professor of Science and Engineering, as well as director of the Center for Solid State Science until his retirement. His research contributions were in many areas of solid-state engineering, especially ion implantation and Rutherford backscattering spectrometry. Among his many accolades, Dr. Mayer was recipient of the Materials Research Society’s Von Hippel Award, a fellow of the American Physical Society and Institute of Electrical and Electronic Engineers, and an elected member of the National Academy of Engineering.

Yongqiang Wang is the team leader of the Ion Beam Materials Laboratory (IBML) in Los Alamos National Laboratory. Dr. Wang has worked in the field of ion beam applications in materials research for more than 25 years. Over the years, he has used and maintained a variety of electrostatic accelerators and implanters for research and education. He is a co-author of nearly 200 peer-reviewed publications, three invited book chapters, two US patents, and the Handbook on Modern Ion Beam Materials Analysis (2nd edition). He is a member of the International Conference Committee for Ion Beam Analysis. He was a co-chair of the 21st International Conference on Ion Beam Analysis in Seattle, Washington, in June 2013. He currently serves as a co-chair of the Biennial International Conference on Application of Accelerators in Research and Industry (CAARI).

Review:

This book will be immensely useful both as a reference and textbook, as it presents the fundamentals, all primary ion beam analysis techniques, and many specific applications together in one place. It should prove to be immensely useful as a reference or textbook for any scientist or student of the field.
―Floyd Del McDaniel, Professor of Physics and Materials Science & Engineering, Director of the Ion Beam Modification and Analysis Laboratory, University of North Texas

This is a must-have ion beam analysis textbook or reference handbook ... . It covers all aspects of ion beam fundamentals and important applications with tables, charts, and excellent examples. ... homework problems are also given at the end of each chapter ... this book could be used as a textbook for a graduate course on ion beam science and technology.
―Wei-Kan Chu, Research Director and Distinguished University Professor of Physics, The University of Houston

The approach the authors have taken, with a good balance between fundamentals and applications, will make their book especially useful for students entering graduate studies or starting senior undergraduate projects.
―J.L. (Iain) Campbell, Professor Emeritus, Department of Physics, University of Guelph

An indispensable book for everyone, student or expert, dealing with ion beam analysis ... Highly recommended.
―Andrzej Turos, Professor and Head of Department of Microstructural Research, University of Warsaw

This is a must-have book for those embarking on the use of ion beams for materials analysis. It brings together all the essential knowledge in a convenient, compact, and up-to-date way.
―S.T. Picraux, Chief Scientist, Center for Integrated Nanotechnologies, Los Alamos National Laboratory

... a coherent presentation of the basics of nuclear reactions and scattering along with a comprehensive presentation on how MeV ion beams are used for analysis. Each chapter ends with a set of problems and useful references. This book will be useful as a text for those teaching a course on ion-solid interactions and as a reference for practitioners.
―William A. Lanford, Professor of Physics, University at Albany

The book Ion Beam Analysis: Fundamentals and Applications will be an important addition to the libraries of scientists and engineers who are already practitioners of these important techniques, but its main utility will be for students, in a wide spectrum of fields, whose research could potentially benefit from IBA or those who are just starting to utilize IBA.
―Barney L. Doyle, Distinguished Member of the Technical Staff, Sandia National Laboratories

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Michael Nastasi, James W. Mayer, Yongqiang Wang
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Book Description Taylor Francis Inc, United States, 2014. Hardback. Book Condition: New. Language: English . Brand New Book. Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. * Examines classical collision theory * Details the fundamentals of five specific ion beam analysis techniques * Illustrates specific applications, including biomedicine and thin film analysis * Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA. Bookseller Inventory # AA69781439846384

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Michael Nastasi, James W. Mayer, Yongqiang Wang
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Book Description Taylor Francis Inc, United States, 2014. Hardback. Book Condition: New. Language: English . Brand New Book. Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. * Examines classical collision theory * Details the fundamentals of five specific ion beam analysis techniques * Illustrates specific applications, including biomedicine and thin film analysis * Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA. Bookseller Inventory # AA69781439846384

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Book Description Taylor Francis Inc, United States, 2014. Hardback. Book Condition: New. Language: English . This book usually ship within 10-15 business days and we will endeavor to dispatch orders quicker than this where possible. Brand New Book. Ion Beam Analysis: Fundamentals and Applications explains the basic characteristics of ion beams as applied to the analysis of materials, as well as ion beam analysis (IBA) of art/archaeological objects. It focuses on the fundamentals and applications of ion beam methods of materials characterization. The book explains how ions interact with solids and describes what information can be gained. It starts by covering the fundamentals of ion beam analysis, including kinematics, ion stopping, Rutherford backscattering, channeling, elastic recoil detection, particle induced x-ray emission, and nuclear reaction analysis. The second part turns to applications, looking at the broad range of potential uses in thin film reactions, ion implantation, nuclear energy, biology, and art/archaeology. * Examines classical collision theory * Details the fundamentals of five specific ion beam analysis techniques * Illustrates specific applications, including biomedicine and thin film analysis * Provides examples of ion beam analysis in traditional and emerging research fields Supplying readers with the means to understand the benefits and limitations of IBA, the book offers practical information that users can immediately apply to their own work. It covers the broad range of current and emerging applications in materials science, physics, art, archaeology, and biology. It also includes a chapter on computer applications of IBA. Bookseller Inventory # BTE9781439846384

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