Plasmonic Nanolithography: Towards next generation nano-manufacturing

 
9783838326061: Plasmonic Nanolithography: Towards next generation nano-manufacturing
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As of now, the next-generation nano-manufacturing which can fulfill the cost, resolution, and throughput requirements for the fabrication of a wide range of nano-scale devices is still uncertain. Photolithography which served as the main manufacturing method in the past decades has the resolution limit, known as the diffraction limit. To reduce the features size, the employment of shorter wavelength light sources has come to the turning point where the cost of the system and the cycle time for mask fabrication are critical. Plasmonic optics is attracting a huge interest from scientific community due to a potential to manipulate light at nanometer length scale owing to the dispersive behavior of surface plasmons. Through the use of surface plasmons, a series of novel nanolithography techniques are proposed for high-resolution patterning beyond diffraction limit while using conventional light sources. These techniques open up exciting avenues towards next-generation nano-manufacturing.

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Srituravanich, Werayut / Zhang, Xiang
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Book Description Condition: New. Publisher/Verlag: LAP Lambert Academic Publishing | Towards next generation nano-manufactuing | As of now, the next-generation nano-manufacturing which can fulfill the cost, resolution, and throughput requirements for the fabrication of a wide range of nano-scale devices is still uncertain. Photolithography which served as the main manufacturing method in the past decades has the resolution limit, known as the diffraction limit. To reduce the features size, the employment of shorter wavelength light sources has come to the turning point where the cost of the system and the cycle time for mask fabrication are critical. Plasmonic optics is attracting a huge interest from scientific community due to a potential to manipulate light at nanometer length scale owing to the dispersive behavior of surface plasmons. Through the use of surface plasmons, a series of novel nanolithography techniques are proposed for high-resolution patterning beyond diffraction limit while using conventional light sources. These techniques open up exciting avenues towards next-generation nano-manufacturing. | Format: Paperback | Language/Sprache: english | 185 gr | 128 pp. Seller Inventory # K9783838326061

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Book Description LAP Lambert Acad. Publ. Mrz 2010, 2010. Taschenbuch. Condition: Neu. Neuware - As of now, the next-generation nano-manufacturing which can fulfill the cost, resolution, and throughput requirements for the fabrication of a wide range of nano-scale devices is still uncertain. Photolithography which served as the main manufacturing method in the past decades has the resolution limit, known as the diffraction limit. To reduce the features size, the employment of shorter wavelength light sources has come to the turning point where the cost of the system and the cycle time for mask fabrication are critical. Plasmonic optics is attracting a huge interest from scientific community due to a potential to manipulate light at nanometer length scale owing to the dispersive behavior of surface plasmons. Through the use of surface plasmons, a series of novel nanolithography techniques are proposed for high-resolution patterning beyond diffraction limit while using conventional light sources. These techniques open up exciting avenues towards next-generation nano-manufacturing. 128 pp. Englisch. Seller Inventory # 9783838326061

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Book Description LAP Lambert Acad. Publ. Mrz 2010, 2010. Taschenbuch. Condition: Neu. Neuware - As of now, the next-generation nano-manufacturing which can fulfill the cost, resolution, and throughput requirements for the fabrication of a wide range of nano-scale devices is still uncertain. Photolithography which served as the main manufacturing method in the past decades has the resolution limit, known as the diffraction limit. To reduce the features size, the employment of shorter wavelength light sources has come to the turning point where the cost of the system and the cycle time for mask fabrication are critical. Plasmonic optics is attracting a huge interest from scientific community due to a potential to manipulate light at nanometer length scale owing to the dispersive behavior of surface plasmons. Through the use of surface plasmons, a series of novel nanolithography techniques are proposed for high-resolution patterning beyond diffraction limit while using conventional light sources. These techniques open up exciting avenues towards next-generation nano-manufacturing. 128 pp. Englisch. Seller Inventory # 9783838326061

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Book Description LAP Lambert Acad. Publ. Mrz 2010, 2010. Taschenbuch. Condition: Neu. This item is printed on demand - Print on Demand Neuware - As of now, the next-generation nano-manufacturing which can fulfill the cost, resolution, and throughput requirements for the fabrication of a wide range of nano-scale devices is still uncertain. Photolithography which served as the main manufacturing method in the past decades has the resolution limit, known as the diffraction limit. To reduce the features size, the employment of shorter wavelength light sources has come to the turning point where the cost of the system and the cycle time for mask fabrication are critical. Plasmonic optics is attracting a huge interest from scientific community due to a potential to manipulate light at nanometer length scale owing to the dispersive behavior of surface plasmons. Through the use of surface plasmons, a series of novel nanolithography techniques are proposed for high-resolution patterning beyond diffraction limit while using conventional light sources. These techniques open up exciting avenues towards next-generation nano-manufacturing. 128 pp. Englisch. Seller Inventory # 9783838326061

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Book Description LAP Lambert Acad. Publ., 2010. Paperback. Condition: New. Language: English . Brand New Book. As of now, the next-generation nano-manufacturing which can fulfill the cost, resolution, and throughput requirements for the fabrication of a wide range of nano-scale devices is still uncertain. Photolithography which served as the main manufacturing method in the past decades has the resolution limit, known as the diffraction limit. To reduce the features size, the employment of shorter wavelength light sources has come to the turning point where the cost of the system and the cycle time for mask fabrication are critical. Plasmonic optics is attracting a huge interest from scientific community due to a potential to manipulate light at nanometer length scale owing to the dispersive behavior of surface plasmons. Through the use of surface plasmons, a series of novel nanolithography techniques are proposed for high-resolution patterning beyond diffraction limit while using conventional light sources. These techniques open up exciting avenues towards next-generation nano-manufacturing. Seller Inventory # KNV9783838326061

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Book Description LAP Lambert Academic Publishing, 2010. Condition: New. book. Seller Inventory # M3838326067

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