Items related to Atom Lithography: From Newtonian to Path integral approach
This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated.
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About the Author:
Monsit obtained his M.Sci. in Theoretical Physics from Durham University, UK, in 2006. Currently he is working towards his PhD in the area of atomic and molecular physics, where he specialises in the interactions of Rydberg atoms with light. During 2002- 2012, he has been awarded a scholarship from the Royal Thai Government.
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- PublisherLAP LAMBERT Academic Publishing
- Publication date2010
- ISBN 10 3843371962
- ISBN 13 9783843371964
- BindingPaperback
- Number of pages76
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Atom Lithography
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LAP LAMBERT Academic Publishing Dez 2010
(2010)
ISBN 10: 3843371962
ISBN 13: 9783843371964
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Book Description Taschenbuch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated. 76 pp. Englisch. Seller Inventory # 9783843371964
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Atom Lithography : From Newtonian to Path integral approach
Published by
LAP LAMBERT Academic Publishing
(2010)
ISBN 10: 3843371962
ISBN 13: 9783843371964
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Book Description Taschenbuch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This book discusses two approaches used as the tools to study atom lithography. The book begins with theoretical descriptions of the light force as the key element to understand how the neutral atoms can be controlled by using light. From the view point of Newtonian mechanics, the neutral atoms feel the dipole force while interacting with the standing wave. The trajectory of the atoms can be computed from Newton's second law. On the other hand, the neutral atoms can be viewed as a wave described by a wavefunction and hence can be perturbed by a standing wave. While the wavefunction propagates through the standing wave, its phase is altered and the new wavefunction is generated. Using the concept of Feynman's path integral, the perturbed wavefunction and its interference pattern can then be calculated. Seller Inventory # 9783843371964
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Atom Lithography: From Newtonian To Path Integral Approach
Published by
Lap Lambert Academic Publishing
(2010)
ISBN 10: 3843371962
ISBN 13: 9783843371964
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Paperback
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Book Description Paperback. Condition: Brand New. In Stock. Seller Inventory # zk3843371962
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