Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology)

ISBN 10: 0815512813 / ISBN 13: 9780815512813

Published by William Andrew, 1991

About this Item

Gently read. May have name of previous ownership, or ex-library edition. Binding tight; spine straight and smooth, with no creasing; covers clean and crisp. Minimal signs of handling or shelving. 100% GUARANTEE! Shipped with delivery confirmation, if you're not satisfied with purchase please return item for full refund. Ships USPS Media Mail.

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Bibliographic Details

• Title: Handbook of VLSI Microlithography: Principles, Technology and Applications (Materials Science and Process Technology)
• Publisher: William Andrew
• Publication Date: 1991
• Language: English
• ISBN 10: 0815512813
• ISBN 13: 9780815512813
• Binding: Hardcover
• Condition: very_good

About this title

Synopsis

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry.

The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production.

Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

About the Author

John Helbert is a Senior Member of the Motorola Technical Staff. He earned his doctorate in Physical