IC Fabrication Technology

Gouranga Bose

Published by McGraw Hill Education, 2014
ISBN 10: 1259029581 / ISBN 13: 9781259029585
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IC fabrication technology is at the core of the subject of VLSI. For, practical implementation of the design and principles of VLSI is possible only through an in-depth understanding of the fabrication processes and procedures. In order that young undergraduate students be initiated into this extremely dynamic yet complex world of fabrication, IC Fabrication Technology has been written in a highly illustrative manner that allows comprehensive visualization. The book provides an introduction to the major fabrication process steps for silicon-based CMOS technology and provides necessary literature that can help generate experiments. Thus, the undergraduate students pursuing a course on IC fabrication will find this book necessary and postgraduate students pursuing the discipline of VLSI will find this book handy. Contents: 1. Overview of Metal-Oxide-Semiconductor (MOS) Transistor 2. Silicon Wafer Preparation for MOS Transistor Fabrication 3. MOS Transistor Process Flow 4. Oxidation 5. Mask 6. Lithography 7. Etching 8. Diffusion 9. Ion-Implantation 10. Thin Film Deposition 11. ULSI (nano) Fabrication Printed Pages: 0. Bookseller Inventory # 89054

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Synopsis: Please Read Notes: Brand New, International Softcover Edition, Printed in black and white pages, minor self wear on the cover or pages, Sale restriction may be printed on the book, but Book name, contents, and author are exactly same as Hardcover Edition. Fast delivery through DHL/FedEx express.

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Bibliographic Details

Title: IC Fabrication Technology
Publisher: McGraw Hill Education
Publication Date: 2014
Binding: Softcover
Book Condition: New
Edition: First edition.

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ISBN 10: 1259029581 ISBN 13: 9781259029585
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