IC Mask Design: Essential Layout Techniques

Christopher Saint, Judy Saint

Published by McGraw-Hill Professional, 2002
ISBN 10: 0071389962 / ISBN 13: 9780071389969
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Synopsis: Integrated Circuit Mask Design teaches integrated circuit (IC) processes, mask design techniques, and fundamental device concepts in everyday language. It develops ideas from the ground up, building complex concepts out of simple ones, constantly reinforcing what has been taught with examples, self-tests and sidebars covering the motivation behind the material covered.

From the Back Cover: THE PLAIN-ENGLISH GUIDE TO LEARNING INTEGRATED CIRCUIT MASK DESIGN

An essential reference for experienced professionals and beginners alike.

Now you don’t need an engineering background to master basic integrated circuit mask design! In this straightforward, jargon-free tutorial, co-author Chris Saint, one of IBM’s top instructors, thoroughly covers everything from initial layout to final verification. Using clear, everyday language even a beginner can understand, this essential primer, rich in practical techniques, covers:
* Integrated circuit processes
* High frequency/radio frequency layout techniques
* Fundamental device concepts
* Verification tool use and samples
* Matching and noise considerations
* Digital and analog layout
* Parasitics
* Floorplanning
* Packaging
* Key rules of thumb throughout
* Two extensive case studies that comprehensively analyze complete CMOS and bipolar layout examples

Utilizing a logical layered approach to teaching, Chris and Judy Saint present complicated concepts from the ground up, building on the simple until the complex becomes crystal clear. In order to reinforce key techniques, each chapter includes examples, self-tests, sidebars, preview points, “motivation” boxes, and worked study examples–as well as the authors’ refreshing humor.

Co-written by an accomplished corporate teacher and utilizing proven teaching methods and materials, IC Mask Design is the fastest route for non-engineers to understand every phase and practical technique of IC mask design. The rules of thumb contained herein—honed by years of experience—will bring the mask designer a greater level of understanding than simply learning processes.

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Bibliographic Details

Title: IC Mask Design: Essential Layout Techniques
Publisher: McGraw-Hill Professional
Publication Date: 2002
Binding: Hardcover
Book Condition: New
Edition: 1.

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Christopher Saint; Judy Saint
Published by McGraw-Hill Professional (2002)
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