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Language: English
Published by William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Seller: Books Puddle, New York, NY, U.S.A.
Condition: New. pp. 672.
Language: English
Published by William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
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Language: English
Published by William Andrew 1991-01-01, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
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Language: English
Published by D. S. Brewer, Cambridge, 2025
ISBN 10: 1843846985 ISBN 13: 9781843846987
Hardcover. Condition: Near Fine. A nice, bright copy. ; 6.5 X 1 X 9.75 inches; 266 pages.
Language: English
Published by William Andrew Publishing, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
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Hardcover. Condition: As New. Hardcover book in excellent condition, text is unmarked and pages are tight.
Language: English
Published by Elsevier Science & Technology|William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Seller: moluna, Greven, Germany
Gebunden. Condition: New. Offers a look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography, electron beam, ion beam, and x-ray lithography.This han.
Condition: Gut. Zustand: Gut | Seiten: 1022 | Sprache: Englisch | Produktart: Bücher | Keine Beschreibung verfügbar.
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Add to basketHardcover. Condition: Brand New. 1st edition. 671 pages. 10.00x6.75x2.25 inches. In Stock. This item is printed on demand.
Language: English
Published by Elsevier Science & Technology, William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, Germany
Buch. Condition: Neu. This item is printed on demand - it takes 3-4 days longer - Neuware -This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook. Englisch.
Language: English
Published by Elsevier Science & Technology, William Andrew, 1991
ISBN 10: 0815512813 ISBN 13: 9780815512813
Seller: AHA-BUCH GmbH, Einbeck, Germany
Buch. Condition: Neu. nach der Bestellung gedruckt Neuware - Printed after ordering - This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.