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SPECTROPHOTOMETRIC THICKNESS MEASUREMENT FOR VERY THIN SI02 FILMS ON SI
Language: English
Published by J Applied Physics, 1970
Magazine / Periodical
Pamphlet. Condition: Very Good. Vol 41, No 2, pp. 787-790, Illus, 4to, Extracted from orig vol, begins with title page, stapled & trimmed, thus is llike a pamphlet, VG.
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Proceedings of the Symposium on Etching for Pattern Definition
Language: English
Published by The Electrochemical Society, Inc., Princeton, NJ, 1976
Original Wraps. Condition: Very Good. No Jacket. Softcover, very good with pages clean and unmarked. Light wear to covers, page edges have minor soiling. Last 80 pages have been bent. A classic reference for plasma etching for microelectronics and micromachining.
