Items related to Glow Discharge Processes: Sputtering and Plasma Etching
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
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About the Author:
Brian Chapman is the author of Glow Discharge Processes: Sputtering and Plasma Etching, published by Wiley.
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- PublisherWiley-Interscience
- Publication date1980
- ISBN 10 047107828X
- ISBN 13 9780471078289
- BindingHardcover
- Edition number1
- Number of pages432
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Glow Discharge Processes: Sputtering and Plasma Etching
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Glow Discharge Processes: Sputtering and Plasma Etching
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ISBN 13: 9780471078289
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Glow Discharge Processes: Sputtering and Plasma Etching
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ISBN 13: 9780471078289
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