Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology) - Hardcover
Synopsis
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
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About the Author
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
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Plasma Etching (Hardcover)
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Oxford University Press, Oxford, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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Hardcover. Condition: new. Hardcover. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability. Seller Inventory # 9780198562870
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Plasma Etching : Fundamentals and Applications
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Plasma Etching
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Oxford University Press, USA, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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Plasma Etching
Published by
Oxford University Press, USA, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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Plasma Etching : Fundamentals and Applications
Published by
Oxford University Press, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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Plasma Etching : Fundamentals and Applications
Published by
Oxford University Press, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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