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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology) - Hardcover
Synopsis
This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
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About the Author
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
"About this title" may belong to another edition of this title.
- PublisherOxford University Press
- Publication date1998
- ISBN 10 019856287X
- ISBN 13 9780198562870
- BindingHardcover
- LanguageEnglish
- Number of pages356
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Plasma Etching : Fundamentals and Applications
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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
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Plasma Etching
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ISBN 10: 019856287X
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Plasma Etching
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ISBN 10: 019856287X
ISBN 13: 9780198562870
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Plasma Etching (Hardcover)
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ISBN 10: 019856287X
ISBN 13: 9780198562870
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Hardcover. Condition: new. Hardcover. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. Shipping may be from our Sydney, NSW warehouse or from our UK or US warehouse, depending on stock availability. Seller Inventory # 9780198562870
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Plasma Etching: Fundamentals and Applications (Series on Semiconductor Science and Technology)
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Plasma Etching : Fundamentals and Applications
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Plasma Etching : Fundamentals and Applications
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ISBN 10: 019856287X
ISBN 13: 9780198562870
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Plasma Etching (Hardcover)
Published by
Oxford University Press, Oxford, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
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Seller: Grand Eagle Retail, Fairfield, OH, U.S.A.
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Hardcover. Condition: new. Hardcover. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored. This item is printed on demand. Shipping may be from multiple locations in the US or from the UK, depending on stock availability. Seller Inventory # 9780198562870
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Plasma Etching : Fundamentals and Applications
Published by
Oxford University Press, 1998
ISBN 10: 019856287X
ISBN 13: 9780198562870
Used
Hardcover
Seller: GreatBookPricesUK, Woodford Green, United Kingdom
Seller rating 5 out of 5 stars
Condition: As New. Unread book in perfect condition. Seller Inventory # 79878
Quantity: Over 20 available