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Synopsis
Evaluating the effectiveness of conventional wet processes for cleaning silicon wafers in semiconductor production, this reference reveals concrete measures to improve ultrapure water quality reviewing the structure and physical characteristics of ultrapure water molecules.
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About the Author
Tadahiro Ohmi is a Professor in the Electronics Department of the Faculty of Engineering at Tohoku University, Sendai, Japan. Dr. Ohmi is a member of the Institute of Electrical and Electronics Engineers, the Electrochemical Society, the Institute of Electrical Engineers (Japan). and the Japanese Applied Physics Society. among others. He received the B.S. degree (1961). the M.S. degree (1963), and the Ph.D. degree (1966) from the Tokyo Institute of Technology. Japan.
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Ultra-Clean Technology Handbook: Volume 1: Ultra-Pure Water
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Ultra-Clean Technology Handbook
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