Synopsis
Presents state-of-the-art research in microelectronic processing for very large scale integration. Emphasizing applications and techniques, this book provides considerable insight into Japan's technological effort in this important area of science. Focuses on research involving plasma deposition and dry etching. Considerable attention is devoted to MOS gate fabrication, the studies of the influence of process parameters on electrical properties, dry processing technologies, and the theory of plasma chemical reactions.
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Language Notes
Text: English, Japanese (translation)
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Applications of Plasma Processes to VLSI Technology
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Applications of Plasma Processes to Vlsi Technology
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Applications of Plasma Processes to VLSI Technology
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Condition: Used: Acceptable. 1985 hardcover no dj xlibrary copy withdrawn stamp on edge of pages/ in book clean text has age spots has book plate and card pocket 394 pages::: H-10. Seller Inventory # 0611IZ6DHVJ
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Applications of Plasma Processes to VLSI Technology
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John Wiley & Sons, New York, 1985
ISBN 10: 0471869600
ISBN 13: 9780471869603
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Hardcover
Seller: A & I PEDERSEN, Macclesfield, CHS, United Kingdom
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Hard Cover. First English Language Edition. Hard blue covers, content is as new, ex library copy with usual stamps and labels, no pocket and no external markings, otherwise a fine copy, pp xiv,394. Text figures and diagrams throughout. Size: 16x24cm. Seller Inventory # 005143
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