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Handbook of Chemical Vapor Deposition: Principles, Technology and Applications (Materials Science and Process Technology) - Hardcover

 
9780815514329: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications (Materials Science and Process Technology)
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Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

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About the Author:
Hugh Pierson is a private consultant in Chemical Vapor Deposition. He was the head of the Deposition
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"...presents an objective and systematic assessment." --High Tech Ceramics News

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  • PublisherWilliam Andrew
  • Publication date2000
  • ISBN 10 0815514328
  • ISBN 13 9780815514329
  • BindingHardcover
  • Edition number2
  • Number of pages506

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