Items related to Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer...
Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX (Proceedings of Spie) - Softcover
- PublisherSociety of Photo Optical
- Publication date1990
- ISBN 10 0819403105
- ISBN 13 9780819403100
- BindingPaperback
- LanguageEnglish
- Edition number1
- EditorResnick Douglas J.
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Electron-Bean, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV: Volume 1263. Proceedings of SPIE; 7-8 March 1990, Santa Clara, California
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SPIE PRESS-The International Society for Optical Engineering, Bellingham, WA, U.S.A., 1990
ISBN 10: 0819403105
ISBN 13: 9780819403100
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Paperback
First Edition
Seller: SUNSET BOOKS 2, Newark, OH, U.S.A.
Seller rating 3 out of 5 stars
Paperback. Condition: Very Good. No Jacket. 1st. Seller's image, know what you are getting! ORIGINAL, NOT A REPRINT OR PHOTOCOPY!! NO Dust Jacket. Has or May Have all standard Library markings, pocket, labels, stamps, wear and soil to covers. CLEAN TEXT! See Picture! The Copyright date is 1990 for this Printing. This volume was purchased through DMRO from the Wright-Patterson Technical Library in the late 1990's. Thank you for your purchase from Sunset Books! Help Promote World Literacy, GIVE a Book as a GIFT!! In stock, Ships from Ohio. Will not fit in Flat Rate Priority Mail envelope. USPS Variable Rate applies for Domestic or International. WE COMBINE SHIPPING ON MULTIPLE PURCHASES!!!! SEE PICTURES!!!!! ANY ODD/GREEN TONES ON THE SCANS ARE CAUSED BY MY SCANNER!! All of our Technical/Textbook/Ex-Library volumes were obtained legally through Public or Auction sales. Size: 4to Size: 4to - over 9¾ - 12" tall. Ex-Library. Seller Inventory # 015111
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