Rapid Thermal and Integrated Processing IV: Volume 470 (MRS Proceedings) - Hardcover

Hardcover

ISBN 10: 1558993746 ISBN 13: 9781558993747

Publisher: Materials Research Society, 1998

Synopsis

The MRS proceedings series on rapid thermal processing (RTP) has become the predominant international forum for research in this exciting and fast-growing field. In particular, this book in the series clearly indicates that the science of RTP is increasingly better understood and that equipment simulation and engineering have matured. With the so-called 'second generation' equipment vendors are providing useful and production-worthy solutions to the most pertinent problems within RTP - temperature measurement and reproducability. For that reason, the issues of temperature calibration and metrology, along with the International Temperature Scale, are featured. The evaluation and modelling of furnace, mini-bath and single-wafer RTP furnaces as the thermal method of choice are also addressed. Interesting developments are reported in the processing of dielectrics. Applications outside the field of silicon semiconductors are also presented. Topics include: measurement; RTCVD; modelling and manufacturing; integrated processing; silicides; annealing and defects; dielectrics; and RTP of III-V materials and other novel applications.

About this edition

• Publisher: Materials Research Society
• Publication date: 1998
• ISBN 10: 1558993746
• ISBN 13: 9781558993747
• Binding: Hardcover
• Edition number: 1
• Number of pages: 435
• Editor: Gelpey Jeffrey C., Riley Terrence J., Roozeboom Fred, Saito Shuichi