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Particle Beam Microanalysis: Fundamentals, Methods and Applications - Hardcover

 
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Particle beam methods of microanalysis allow high lateral and vertical resolution, high sensitivity, low detection limits, and high accuracy. This book concentrates on methods which complement each other and can be routinely applied in industrial laboratories: scanning and transmission electron microscopy, electron beam X-ray microanalysis, Auger electron microanalysis, and ion beam microanalysis as well as electron beam testing. The principal aim of this book is to support the analyst in his practical work. The theoretical basis is treated only to the extent required to obtain an understanding of the physical fundamentals and to allow effective use of the analytical instruments. The mode of operation of the instruments, the preparation of specimens, the evaluation of the measured signals as well as the detection limits are described in detail. A selection of practical examples drawn mainly from the field of semiconductor technology demonstrates the range of applications and the limitations of the various particle beam methods.

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Fuchs, Oppolzer, Rehme Particle Beam Microanalysis Fundamentals, Methods and Applications Particle beam methods of microanalysis allow high lateral and vertical resolution, high sensitivity, low detection limits, and high accuracy. This book concentrates on methods which complement each other and can be routinely applied in industrial laboratories: scanning and transmission electron microscopy, electron beam X-ray microanalysis, Auger electron microanalysis, and ion beam microanalysis as well as electron beam testing. The principal aim of this book is to support the analyst in his practical work. The theoretical basis is treated only to the extent required to obtain an understanding of the physical fundamentals and to allow effective use of the analytical instruments. The mode of operation of the instruments, the preparation of specimens, the evaluation of the measured signals as well as the detection limits are described in detail. A selection of practical examples drawn mainly from the field of semiconductor technology demonstrates the range of applications and the limitations of the various particle beam methods.

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  • PublisherWiley-VCH
  • Publication date1990
  • ISBN 10 3527268847
  • ISBN 13 9783527268849
  • BindingHardcover
  • LanguageEnglish
  • Edition number1
  • Number of pages508

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ISBN 10:  0895735059 ISBN 13:  9780895735058
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Fuchs, Ekkehard, Hans Rehme and Helmut Oppolzer:
Published by Wiley-VCH, 1990
ISBN 10: 3527268847 ISBN 13: 9783527268849
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gebundene Ausgabe. Condition: Gut. 507 Seiten; Das hier angebotene Buch stammt aus einer teilaufgelösten wissenschaftlichen Bibliothek und trägt die entsprechenden Kennzeichnungen (Rückenschild, Instituts-Stempel.); Schnitt und Einband sind etwas staubschmutzig; der Buchzustand ist ansonsten ordentlich und dem Alter entsprechend gut. Text in ENGLISCHER Sprache! Sprache: Englisch Gewicht in Gramm: 1100. Seller Inventory # 1586147

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Fundamentals, Methods and Applications. Weinheim, VCH 1990. XVIII, 507 S., OPappband Titel mit Besitzvermerk, sonst gut. Seller Inventory # 101287

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Fuchs, Ekkehard; Oppolzer, Helmut; Rehme, Hans
Published by Wiley-VCH, 1990
ISBN 10: 3527268847 ISBN 13: 9783527268849
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