X-Ray Diffraction at Elevated Temperatures - Hardcover

Deborah D.L. Chung

Hardcover

ISBN 10: 3527278427 ISBN 13: 9783527278428

Publisher: Wiley-VCH, 1993

About this title

From the Publisher

The book deals with Berry-Esseen-type inequalities, asymptotic expansions, non-uniform estimates, U-Statistics, and the density problem.

From the Back Cover

X-Ray Diffraction at Elevated Temperatures A Method for in Situ Process Analysis D. D. L. Chung P.W. DeHaven H. Arnold Debashis Ghosh This book offers a comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures. Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis). It describes phase identification, texture analysis, and grain size measurement by way of the in situ process analysis at elevated temperatures. It promotes the use of x-ray diffraction at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, and chemical and electrical engineering.

Edition details

• Publisher: Wiley-VCH
• Publication date: 1993
• Language: English
• ISBN 10: 3527278427
• ISBN 13: 9783527278428
• Binding: Hardcover
• Number of pages: 272