This book documents the proceedings of the Second International Symposium on Adhesion Measurement of Films and Coatings, held in Newark, NJ, October 25-27, 1999. Since the First Symposium (Boston 1992) there had been considerable activity in devising new, more reliable and more efficient ways to measure adhesion of films and coatings, which resulted in the decision to organize the Newark Symposium.

Films and coatings are used for a variety of purposes �€“ functional, decorative, protective, etc. �€“ in a host of applications. Irrespective of the purpose or application of a film or a coating, their adequate adhesion to the underlying substrates is of paramount importance. Concomitantly, the need to develop techniques for quantitative assessment of adhesion of films and coatings is all too obvious.

This volume contains a total of 20 papers, which have all been rigorously peer reviewed and suitably modified before inclusion. The topics include: measurement and analysis of interface adhesion; relative adhesion measurement for thin film structures; adhesion testing of hard coatings by a variety of techniques; challenges and new directions in scratch adhesion testing of coated substrates; application of scratch test to different films and coatings; evaluation of coating-substrate adhesion by indentation experiments; measurement of interfacial fracture energy in multifilm applications; laser induced decohesion spectroscopy (LIDS) for measuring adhesion; pulsed laser technique for assessment of adhesion; blade adhesion test; JKR adhesion test; coefficient of thermal expansion measurement; and residual stresses in diamond films.

This volume, providing the latest information, will be of great value and interest to anyone working in the area of adhesion measurement of films and coatings.

About the Author

Mittal, Kash L.

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