Afterall Spring/Summer 2019 : Spring/Summer 2021, Issue 51

Esche, Charles (EDT); Lewis, Mark (EDT); Haq, Nav (EDT); Husain, Amber (EDT); Mey, Adeena (EDT)

ISBN 10: 1846382505 / ISBN 13: 9781846382505

Published by University of Chicago Press Journals, 2021

About this Item

Unread book in perfect condition.

Seller Inventory # 42466656

Bibliographic Details

• Title: Afterall Spring/Summer 2019 : Spring/Summer 2021, Issue 51
• Publisher: University of Chicago Press Journals
• Publication Date: 2021
• Language: English
• ISBN 10: 1846382505
• ISBN 13: 9781846382505
• Binding: Soft cover
• Condition: As New

About this title

Synopsis

Established in 1998, Afterall is a journal of contemporary art that provides in-depth analysis of art and its social, political, and philosophical contexts. Each issue provides the reader with well-researched contributions that discuss each artist’s work from different perspectives. Contextual essays and other texts discussing events, works, or exhibitions further develop the thematic focus of each issue.
 

About the Authors

Charles Esche is the director of the Van Abbemuseum, Eindhoven and co-editorial director and co-founder of Afterall.

Mark Lewis is an artist, Professor at University of the Arts London, and co-editorial director and co-founder of Afterall.

Nav Haq is associate director at the Museum of Contemporary Art Antwerp where he is responsible for the development of the artistic programme.
 

Amber Husain is a writer, editor, and researcher living and working in London. She is a managing editor of Afterall Books.

Adeena Mey is a researcher and curator. He is the managing editor of Afterall and a lecturer at Lausanne University of Art and Design, Switzerland.