Atomic Layer Deposition

ISBN 10: 3039366521 / ISBN 13: 9783039366521

Published by MDPI AG, 2020

About this Item

Atomic Layer Deposition | Buch | Gebunden | Englisch | 2020 | MDPI AG | EAN 9783039366521 | Verantwortliche Person für die EU: Libri GmbH, Europaallee 1, 36244 Bad Hersfeld, gpsr[at]libri[dot]de | Anbieter: preigu Print on Demand.

Seller Inventory # 131278963

Bibliographic Details

• Title: Atomic Layer Deposition
• Publisher: MDPI AG
• Publication Date: 2020
• Language: English
• ISBN 10: 3039366521
• ISBN 13: 9783039366521
• Binding: Buch
• Condition: Neu
• Dimensions: 250W x 175H x 14D millimeters 250 millimeters width by 175 millimeters height by 14 millimeters depth
• Weight: 555 grams
• Seller catalogs:
  • Bücher

About this title

Synopsis

Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing - known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.