Chemical Solution Deposition of Functional Oxide Thin Films

Language: English

Published by Springer, 2014

321199310X / 9783211993101

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Druck auf Anfrage Neuware - Printed after ordering - This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980's. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed 'cooking recipes' for selected material systems are offered.

Seller Inventory # 9783211993101

Title
Chemical Solution Deposition of Functional Oxide Thin Films
Author
Rainer Waser
Publisher
Springer
Publication year
2014
Condition
Neu
Binding
Buch
Language
English
ISBN 10
321199310X
ISBN 13
9783211993101
Item weight
1,373 grams
Dimensions
241x160x49 mm

AHA-BUCH GmbH

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