Design for Manufacturability with Advanced Lithography

David Z. Pan

ISBN 10: 3319373935 / ISBN 13: 9783319373935

Published by Springer International Publishing, Springer International Publishing, 2016

About this Item

Druck auf Anfrage Neuware - Printed after ordering - This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

Seller Inventory # 9783319373935

Bibliographic Details

• Title: Design for Manufacturability with Advanced Lithography
• Publisher: Springer International Publishing, Springer International Publishing
• Publication Date: 2016
• Language: English
• ISBN 10: 3319373935
• ISBN 13: 9783319373935
• Binding: Taschenbuch
• Condition: Neu
• Dimensions: 235W x 155H x 10D millimeters 235 millimeters width by 155 millimeters height by 10 millimeters depth
• Weight: 277 grams

About this title

Synopsis

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

From the Back Cover

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

• Enables readers to tackle the challenge of layout decompositions for different patterning techniques;
  
• Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design;
  
• Includes coverage of the design for manufacturability with E-Beam lithography.