Design for Manufacturability and Yield for Nano-Scale CMOS

Language: English

Published by Springer, 2007

1402051875 / 9781402051876

Series: Book 5 of 34 - Integrated Circuits and Systems

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Seller: AHA-BUCH GmbH, Einbeck, GermanyAHA-BUCH GmbH

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Druck auf Anfrage Neuware - Printed after ordering - Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

Seller Inventory # 9781402051876

Title
Design for Manufacturability and Yield for Nano-Scale CMOS
Author
Charles Chiang
Publisher
Springer
Publication year
2007
Condition
Neu
Binding
Buch
Language
English
ISBN 10
1402051875
ISBN 13
9781402051876
Item weight
600 grams
Dimensions
241x160x22 mm
Series
Book 5 of 34: Integrated Circuits and Systems

AHA-BUCH GmbH

Einbeck, Germany

5-star seller

AbeBooks seller since August 14, 2006

Shipping rates from Germany to U.S.A.

Item7 to 10 business days5 to 7 business days
First itemUS$ 39.38US$ 50.64
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