Title: Design for Manufacturability and Yield for Nano-Scale CMOS (Integrated Circuits and Systems)
Publisher: Springer
Publication Date: 2010
Language: English
ISBN 10: 9048173035
ISBN 13: 9789048173037
Binding: Soft cover
Condition: New

About this title

Synopsis

Manufacturability and yield are no longer a fabrication, packaging, and test concerns. They are aspects that have to be designed in, and they are everybody’s responsibility. Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, and through statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design’s manufacturability and yield. A must read book for the serious designer.

About the Author

Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA

"About this title" may belong to another edition of this title.

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