This item is printed on demand - it takes 3-4 days longer - Neuware -This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process. It covers all CAD/CAE aspects of a SOC design flow and addresses a new topic (DFM/DFY) critical at 90 nm and beyond. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development. 288 pp. Englisch.

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Bibliographic Details

Title: Design for Manufacturability and Yield for Nano-Scale CMOS
Publisher: Springer Netherlands Jul 2007
Publication Date: 2007
Language: English
ISBN 10: 1402051875
ISBN 13: 9781402051876
Binding: Buch
Condition: Neu
Dimensions: 241 millimeters width by 160 millimeters height by 22 millimeters depth
Weight: 600 grams

About this title

Synopsis

Design for Manufacturability and Yield for Nano-Scale CMOS walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design’s manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

About the Author

Dr. Charles Chiang is R&D Director of the Advanced Technology Group at Synopsys Inc. in Mountain View, CA, USA

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