Design of a Monolithic 3DOF MEMS Capacitive Accelerometer: Utilizing Surface Micromachining Technology Using PolyMUMPS Process

Khan, Muhammad Shuja

ISBN 10: 3845409525 / ISBN 13: 9783845409528

Published by LAP LAMBERT Academic Publishing, 2011

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Bibliographic Details

• Title: Design of a Monolithic 3DOF MEMS Capacitive Accelerometer: Utilizing Surface Micromachining Technology Using PolyMUMPS Process
• Publisher: LAP LAMBERT Academic Publishing
• Publication Date: 2011
• Language: English
• ISBN 10: 3845409525
• ISBN 13: 9783845409528
• Binding: Paperback
• Condition: Like New
• Book Type: book

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Synopsis

Sensors and devices, based on micromachining technology, known as micro-electro-mechanicalsystems or MEMS, have been received increasing attention so far in recent years. Micromachined inertial sensors, consisting of accelerometers and gyroscopes, are one of the most important types of silicon-based sensor. MEMS capacitive accelerometers have been extensively used in automobiles, inertial navigation systems, earth quake detection and many other bio-medical applications. This book deals with the design of a monolithic 3DOF MEMS capacitive accelerometer using both analytical and numerical techniques. Monolithic accelerometer is a single structure having three individual single axis Accelerometers on a single substrate and utilizes a surface micromachining technology using standard PolyMUMPs process. The designed accelerometer is 3mm×3.1mm in size, has low mechanical noise floor, high sense capacitance and high sensitivity along in-plane (x and y) and out-of-plane (z) axes. Performing a detailed finite element analysis in ANSYS 11.o, physical level simulation has been done to verify the deflection for x, y and z axes with respect to the applied acceleration (g).

About the Author

Mr. Khan received MS in Electronic Engineering from Ghulam Ishaq Khan Inst. of Engg. Sci. & Tech., Pakistan in June 2009. He worked as Lecturer in Dept. of Electrical Engg. at COMSATS Institute., Lahore Pakistan from AUG 2009 to JUN 2011. Currently he is at NanoFabrication Facility,CCNY NanoEngg. & Tech. Lab,NewYork as Research Assistant.