Design aspects of rotating cylindrical magnetron cathode | R C-Magnetron applicability for developing tantalum based hard coatings

Krishna Valleti (u. a.)

ISBN 10: 384731856X / ISBN 13: 9783847318569

Published by LAP LAMBERT Academic Publishing, 2015

About this Item

Design aspects of rotating cylindrical magnetron cathode | R C-Magnetron applicability for developing tantalum based hard coatings | Krishna Valleti (u. a.) | Taschenbuch | 148 S. | Englisch | 2015 | LAP LAMBERT Academic Publishing | EAN 9783847318569 | Verantwortliche Person für die EU: preigu GmbH & Co. KG, Lengericher Landstr. 19, 49078 Osnabrück, mail[at]preigu[dot]de | Anbieter: preigu.

Seller Inventory # 106671778

Bibliographic Details

• Title: Design aspects of rotating cylindrical magnetron cathode | R C-Magnetron applicability for developing tantalum based hard coatings
• Publisher: LAP LAMBERT Academic Publishing
• Publication Date: 2015
• Language: English
• ISBN 10: 384731856X
• ISBN 13: 9783847318569
• Binding: Taschenbuch
• Condition: Neu
• Dimensions: 220W x 150H x 10D millimeters 220 millimeters width by 150 millimeters height by 10 millimeters depth
• Weight: 238 grams
• Seller catalogs:
  • Bücher

About this title

Synopsis

Coating uniform thin films on inner surfaces of tubular objects for strategic and commercial applications like barrels is a challenge. Among the several techniques being employed presently for the large area coatings and coatings on tubular objects, cylindrical magnetron cathodes are being used widely. Though there are several designs presently in use, large scope exists for improvements in the design of cylindrical magnetron cathodes. Hence in the present book, design aspects of cylindrical magnetron cathodes useful for coating inner or outer surfaces of planar or tubular surfaces were discussed and arrived at improved (performance) R C-Magnetron cathode geometry. As the tantalum and tantalum based nitride coatings have wide applications in biological, electrical, surface engineering, etc. the same were developed using R C-Magnetron cathodes with different deposition parameters and results pertaining to arriving at the best possible deposition parameters for Ta based hard coatings were presented.

About the Author

Profession: Scientist, Centre for Engineered Coatings, International Advanced Research Centre for Powder metallurgy and New Materials (ARCI), Hyderabad, India.Email: kvalleti@gmail.com or krishna@arci.res.inProf. A Subrahmanyam, Dept. of Physics, IIT Madras, INDIA