Developments in Photoelasticity : A renaissance
Krishnamurthi Ramesh
Sold by AHA-BUCH GmbH, Einbeck, Germany
AbeBooks Seller since August 14, 2006
New - Soft cover
Condition: New
Ships from Germany to U.S.A.
Quantity: 2 available
Add to basketSold by AHA-BUCH GmbH, Einbeck, Germany
AbeBooks Seller since August 14, 2006
Condition: New
Quantity: 2 available
Add to basketNeuware - In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.
Seller Inventory # 9780750324700
In recent years, the field of digital photoelasticity has begun to stabilise. Developments in Photoelasticity presents, in one volume, the time-tested advancements that have brought about a fundamental change in employing photoelastic analysis to solve diverse applications. Based on decades of active research, this authoritative treatment surveys wide-ranging connections in the field, focusing on developments made since 2010. Wide-ranging in its application, this high-level reference text is an invaluable tool for stress analysts, teachers of photo-mechanics and industry practitioners involved in stress analysis, solid mechanics, fracture mechanics, glass stress analysis, and contact mechanics. It also serves as a link between active research and teaching at graduate and senior undergraduate level.
Key Features:
Establishes the basics of photoelasticity with clarity to serve as a primary reference for users of the methodology
Explains phase-shifting methods that are robust enough to allow the reader to implement them with ease.
Explores modern methods based on colour information processing using a single isochromatic image as well as use of conventional polariscopes for complete photoelastic analysis.
Provides carrier fringe analysis tools for quantifying low stress field information for special applications.
Extensive information on a variety of applications of photoelasticity covering domains ranging from biomedical to aerospace to civil engineering applications.
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