Diazonaphthoquinone-Based Resists. This item is unavailable.
Language: English
Published by SPIE Optical Engineering Press, 1993
- Softcover
- Used
Unavailable
Softcover
Condition: Used - Very good
US$ 42.00
Item description from seller
In great condition. Binding is tight and inside is clean and unmarked.
Seller Inventory # 1153703
- Title
- Diazonaphthoquinone-Based Resists
- Author
- Ralph Dammel
- Publisher
- SPIE Optical Engineering Press
- Publication year
- 1993
- Condition
- Very good
- Dust jacket
- No jacket
- Binding
- Soft cover
- Language
- English
- ISBN 10
- 0819410195
- ISBN 13
- 9780819410191
- Seller catalogs
- Engineering, Technology
This book elucidates the reasons underlying the lasting success of DNQ/N resist systems by examining the correlation between the chemical structure of the components and the photoresist performance. The basic chemistries of both DNQ sensitizers and novolak resins are explored. Focus also is placed on the chemical basis of application-related facets of the lithographic process. Methods of increasing process performance, such as image reversal, top layer imaging, antireflection layers, and phase shift technology are treated.
Contents
- Preface to the Series
- Table of Contents
- Preface
- Introduction
- Basic Chemistry of DNQ/Novolak Resists
- Basic Chemistry of Novolaks
- DNQ/Novolak Interactions
- Step-by-step View of the Lithographic Process
- Advanced Processing Schemes for DNQ Resists
- Outlook on DNQ/Novolak Systems
"Synopsis" may belong to another edition of this title.