Doping Engineering for Front-end Processing: Symposium Held March 25-27, 2008, San Francisco, California, U.s.a: Vol 1070

Pawlak, B. j. (Editor)/ Pelaz, M. l. (Editor)/ Law, M. (Editor)/ Suguro, K. (Editor)

ISBN 10: 160511040X / ISBN 13: 9781605110400

Published by Materials Research Society, 2008

About this Item

319 pages. 9.00x6.00x0.75 inches. In Stock. This item is printed on demand.

Seller Inventory # __160511040X

Bibliographic Details

• Title: Doping Engineering for Front-end Processing: Symposium Held March 25-27, 2008, San Francisco, California, U.s.a: Vol 1070
• Publisher: Materials Research Society
• Publication Date: 2008
• Language: English
• ISBN 10: 160511040X
• ISBN 13: 9781605110400
• Binding: Hardcover
• Condition: Brand New
• Weight: 0.57 kilograms

About this title

Synopsis

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.

Book Description

The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.