Doping Engineering for Front-end Processing : Symposium Held March 25-27, 2008, San Francisco, California, U.s.a

Pawlak, B. j. (EDT); Pelaz, M. l. (EDT); Law, M. (EDT); Suguro, K. (EDT)

ISBN 10: 160511040X / ISBN 13: 9781605110400

Published by Cambridge University Press, 2008

About this Item

Seller Inventory # 12414194-n

Bibliographic Details

• Title: Doping Engineering for Front-end Processing : Symposium Held March 25-27, 2008, San Francisco, California, U.s.a
• Publisher: Cambridge University Press
• Publication Date: 2008
• Language: English
• ISBN 10: 160511040X
• ISBN 13: 9781605110400
• Binding: Hardcover
• Condition: New

About this title

Synopsis

Materials scientists, silicon technologists and TCAD researchers come together in this book to share experimental results and physical models, discuss achievements and challenges, and identify key issues for future research in this field. The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.

Book Description

The volume focuses on many aspects related to doping of semiconductors (Si, SiGe and Ge) for device fabrication, and explores areas for single-gate as well as multi-gate devices with planar and vertical architectures. Surface properties, coverage, bonding saturation and passivation, and annealing ambient are also discussed.