Emerging Technologies for In Situ Processing

Language: English

Published by Springer, Springer Sep 2011, 2011

9401071306 / 9789401071307

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This item is printed on demand - Print on Demand Titel. Neuware -1. In-Situ Processing Combining MBE, Lithography and Ion-Implantation.- 2. Motivations and Early Demonstrations for In-Situ Processings For III-V Semiconductor Devices.- 3. Laser Etching and Microelectronic Applications.- 4. Laser-Induced Chemical Processing of Materials.- 5. High Technology Manufacturing: Critical Issues for the Future.- 6. Ultra High Vacuum Processing: MBE.- 7. Epitaxial Growth of III-V Materials on Implanted III-V Substrates.- 8. Mechanisms of Laser-Induced Deposition from the Gas Phase.- 9. Time Resolved Measurements in the Thermally Assisted Photolytic Laser Chemical Vapor Deposition of Platinum.- 10. Excimer Laser Projection Patterning.- 11. Excimer Laser Patterning and Etching of Metals.- 12. Ion Projection Lithography.- 13. UV Light-Assisted Deposition of A1 on Si from TMA.- 14. E-Beam Induced Decomposition of Inorganic Solids.- 15. Electronic Connection Through Silicon Wafers.- 16. The Development and Use of Novel Precursors for Photolytic Deposition of Dielectric Films.- 17. Focused Ion Beam Induced Deposition.- 18. Laser-Induced Metal Deposition for Clear Defect Repair Work on X-Ray Masks.- 19. Confirmation of the Wavelength Dependence of Silicon Oxidation Induced By Visible Radiation.- 20. Focused Ion Beam Technology and Applications.- 21. Laser Direct Writing for Device Applications.- 22. Laser-Induced Photoetching of Semiconductors with Chlorine.- 23. Recent Advances in Photo-Epitaxy for Infrared Detector Fabrication.- 24. Synthesis and Characterization of Laser Driven Powders.- 25. Physical Properties of Laser Written Chromium Oxide Thin Films.- 26. UV Laser Induced Oxidation of Silicon in Solid and Liquid Phase Regime.- 27. Laser Assisted Plasma Etching of Silicon Dioxide.- 28. Nd: Yag Laser Processing for Circuit modification and DirectWriting of Silicon Conductors.- 29. Study of Excimer laser Enhanced Etching of Copper and Silicon With (SUB) Monolayer Coverages of Chlorine.- 30. Surface Chemical Probes and Their Application to the Study of In Situ Semicmductor Processing.Springer-Verlag KG, Sachsenplatz 4-6, 1201 Wien 304 pp. Englisch.…

Seller Inventory # 9789401071307

Title
Emerging Technologies for In Situ Processing
Author
D. J. Ehrlich
Publisher
Springer, Springer Sep 2011
Publication year
2011
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
9401071306
ISBN 13
9789401071307
Item weight
464 grams
Dimensions
235x155x17 mm

buchversandmimpf2000

Emtmannsberg, BAYE, Germany

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