Flux Profile Modeling using Monte Carlo Simulation

Language: English

Published by LAP LAMBERT Academic Publishing Jun 2010, 2010

3838369386 / 9783838369389

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Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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This item is printed on demand - it takes 3-4 days longer - Neuware -Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers. 104 pp. Englisch.

Seller Inventory # 9783838369389

Title
Flux Profile Modeling using Monte Carlo Simulation
Author
Ramprasad Vijayagopal
Publisher
LAP LAMBERT Academic Publishing Jun 2010
Publication year
2010
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
3838369386
ISBN 13
9783838369389
Item weight
173 grams
Dimensions
220x150x7 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germany

5-star seller

AbeBooks seller since January 11, 2012

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BuchWeltWeit Ludwig Meier e.K.

Germany