Fundamentals of Adhesion and Interfaces

In addition to technological advances pushing the development of adhesion and interfacial sciences, recent experimental and computational tools have helped to pull these areas forward. Novel spectroscopic techniques and improved equipment has led to a better understanding of bond formation and breaking upon contact and separation. In addition, the recent advances in computer technology have facilitated both the acquisition of data and the enhancement of theoretical understanding of adhesion and interfacial phenomena.

Because of the rapid advances and importance of the fields of adhesion and interfacial sciences, a three-day symposium entitled ''Fundamentals of Adhesion and Interfaces'' was held in Chicago at the August 1993 meeting of the American Chemical Society. The papers in this volume are based on selected presentations given at this symposium. These papers were originally reviewed and published in two special issues of the Journal of Adhesion Science and Technology.