Hafnium Oxide And Hafnium Silicate For High-K Application: Characterization Of Hafnium Based Oxide Thin Films Deposited By Cvd

Bhandari, Harish; Bhandari, Harish

ISBN 10: 3838333888 / ISBN 13: 9783838333885

Published by Lap Lambert Academic Publishing, 2010

About this Item

232 pages. 8.58x5.91x0.63 inches. In Stock.

Seller Inventory # __3838333888

Bibliographic Details

• Title: Hafnium Oxide And Hafnium Silicate For High-K Application: Characterization Of Hafnium Based Oxide Thin Films Deposited By Cvd
• Publisher: Lap Lambert Academic Publishing
• Publication Date: 2010
• Language: English
• ISBN 10: 3838333888
• ISBN 13: 9783838333885
• Binding: Paperback
• Condition: Brand New
• Weight: 0.31 kilograms

About this title

Synopsis

Novel materials with high-dielectric(k) constants are rapidly gaining attention for their application as gate insulator for future MOS transistors. This book provides the basic principles underlying chemical vapor deposition (CVD) of hafnium oxide and hafnium silicate thin films for high-k application. In addition to the deposition fundamentals, the discussions in the book provide valuable insights to various chemical and physical characterization techniques that can be applied to thin films in general. This easy-to-understand and well- illustrated text is designed for both beginners as well as advanced researchers with a good introduction to the subject of high-k thin films.