HfO2-Based Ferroelectric Materials

Language: English

Published by Wiley-VCH Sep 2026, 2026

3527353186 / 9783527353187

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Seller: Rheinberg-Buch Andreas Meier eK, Bergisch Gladbach, GermanyRheinberg-Buch Andreas Meier eK

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Neuware -Explores HfO2-based ferroelectrics for memory, sensing, and advanced electronic applicationsFerroelectric hafnium oxide (HfO2)-based materials have transformed the field of electronic materials and device design, offering pathways to overcome long-standing barriers in scalability, compatibility, and reliability. The emergence of robust ferroelectricity in doped HfO2 has revolutionized both research and industry perspectives, providing a viable solution where conventional ferroelectrics often fell short.With contributions from leading experts, HfO2-Based Ferroelectric Materials addresses the critical need for a consolidated reference on HfO2-based ferroelectrics, offering foundational knowledge as well as the latest insights into fabrication, material characterization, and device integration. The book opens with fundamentals of ferroelectricity and the mechanisms driving HfO2-based ferroelectric behavior, before progressing to detailed examinations of deposition techniques, superlattice structures, and reliability considerations. It further explores a broad spectrum of applications, including non-volatile memories, neuromorphic computing, compute-in-memory architectures, and negative capacitance transistors, alongside emerging roles in energy storage, microwave technologies, and piezoelectric systems. Special attention is given to persistent challenges such as the wake-up effect, fatigue, and imprint issues and the strategies developed to mitigate them.An authoritative and well-structured resource for advancing the frontiers of electronic materials and device technologies, HfO2-Based Ferroelectric Materials:\* Explains the origins of ferroelectricity in doped HfO2 and its unique material advantages\* Details deposition techniques and approaches to regulating ferroelectric behavior\* Examines device-level challenges, including wake-up effect, fatigue, and imprint reliability\* Highlights applications spanning non-volatile memories, neuromorphic computing, and energy-efficient devices\* Discusses advanced designs such as superlattice-like laminate structures and 3D ferroelectric memories\* Provides insight into the reliability of HfO2-based thin films, capacitors, and field-effect transistorsHfO2-Based Ferroelectric Materials: Fabrication, Characterization, and Device Applications is an essential resource for materials scientists, electronics engineers, semiconductor and solid-state physicists, and professionals in the semiconductor and sensor industries. It is also a valuable reference for graduate-level courses in electronic materials, semiconductor devices, and advanced nanotechnology within physics, materials science, and electrical engineering degree programs. 480 pp. Englisch. …

Seller Inventory # 9783527353187

Title
HfO2-Based Ferroelectric Materials
Author
Xubing Lu
Publisher
Wiley-VCH Sep 2026
Publication year
2026
Condition
Neu
Binding
Buch
Language
English
ISBN 10
3527353186
ISBN 13
9783527353187
Item weight
1,041 grams
Dimensions
252x175x30 mm

Rheinberg-Buch Andreas Meier eK

Bergisch Gladbach, Germany

5-star seller

AbeBooks seller since November 17, 2008

Shipping rates from Germany to U.S.A.

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Rheinberg-Buch Andreas Meier eK

Germany