High Density Plasma Sources: Design, Physics and Performance

Popov, Oleg A. (Editor) / Popov, Oleg A. (Primary Contributor)

ISBN 10: 145577815X / ISBN 13: 9781455778157

Published by William Andrew, 2011

About this Item

466 pages. 9.50x6.25x1.05 inches. In Stock.

Seller Inventory # zk145577815X

Bibliographic Details

• Title: High Density Plasma Sources: Design, Physics and Performance
• Publisher: William Andrew
• Publication Date: 2011
• Language: English
• ISBN 10: 145577815X
• ISBN 13: 9781455778157
• Binding: Paperback
• Condition: Brand New
• Weight: 0.85 kilograms

About this title

Synopsis

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

From the Back Cover

This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such as etching and deposition. The authors are the leading experts in the field who are original inventors and designers of plasma sources they describe in this book. This book gives a balanced treatment of both the theoretical aspects and practical applications. It should be of considerable interest to scientists and engineers working on plasma source designs and process developments.