High Power Impulse Magnetron Sputtering

Language: English

Published by Elsevier Science & Technology, Elsevier, 2019

0128124547 / 9780128124543

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Seller: BuchWeltWeit Ludwig Meier e.K., Bergisch Gladbach, GermanyBuchWeltWeit Ludwig Meier e.K.

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This item is printed on demand - it takes 3-4 days longer - Neuware -High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Englisch.

Seller Inventory # 9780128124543

Title
High Power Impulse Magnetron Sputtering
Author
Daniel Lundin
Publisher
Elsevier Science & Technology, Elsevier
Publication year
2019
Condition
Neu
Binding
Taschenbuch
Language
English
ISBN 10
0128124547
ISBN 13
9780128124543
Item weight
630 grams
Dimensions
229x152x18 mm

BuchWeltWeit Ludwig Meier e.K.

Bergisch Gladbach, Germany

5-star seller

AbeBooks seller since January 11, 2012

Shipping rates from Germany to U.S.A.

Item5 to 15 business days5 to 15 business days
First itemUS$ 26.40US$ 26.40
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BuchWeltWeit Ludwig Meier e.K.

Germany